CRITICAL DIMENSION CONTROL IN X-RAY MASKS WITH ELECTROPLATED GOLD ABSORBERS.

被引：6

作者：

Windbracke, W. ^{[1
]}

Betz, H. ^{[1
]}

Huber, H.-L. ^{[1
]}

Pilz, W. ^{[1
]}

Pongratz, S. ^{[1
]}

机构：

[1] Fraunhofer Inst fuer, Mikrostrukturtechnik, Berlin, West, Ger, Fraunhofer Inst fuer Mikrostrukturtechnik, Berlin, West Ger

来源：

Microelectronic Engineering | 1986年 / 5卷 / 1-4期

关键词：

GOLD PLATING - LITHOGRAPHY - X-RAYS - Applications;

D O I：

10.1016/0167-9317(86)90032-8

中图分类号：

学科分类号：

摘要：

This paper describes a multi-layer technique for e-beam written X-ray master masks with electroplated gold absorbers, which allows the meeting of the demands on controling linewidth of 0. 5 mu m better than plus or minus 50 nm. Besides the multi-layer process for e-beam written master masks, a procedure for X-ray mask copying is described, which provides a faster and simpler single-layer resist technology. The main contribution to linewidth variation results from the dose/development behavior of the single-layer resist, being used as the electroplating mould. Appropriate exposure and development conditions allow a CD control of the work mask drawn via a submaster within the same error budget as on the master mask.

引用

页码：73 / 80