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Free volume and relaxation effects in polymer layers. Application to the spin coating and bake processes
被引：7
作者：
机构：
[1] Paniez, P.
[2] Pons, M.
[3] Joubert, O.
来源：
Paniez, P.
|
1600年
/
11期
关键词：
Lithography;
-;
Plasmas--Etching;
Polymers;
D O I：
10.1016/0167-9317(90)90153-K
中图分类号：
学科分类号：
摘要：
The variations in free volume of polymer layers can be observed using simple plasma etching techniques along with laser interferometry monitoring. During oxygen plasma etching, the polymer layers are heated and may undergo volume relaxation. Thus, polymers can be classified according to their relative relaxation response. This technique appears to be a simple way of monitoring the baking conditions of lithographic layers.
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