Photoetchable glass for microsystems: tips for atomic force microscopy

被引：11

作者：

机构：

[1] Dietrich, T.R.

[2] Abraham, M.

[3] Diebel, J.

[4] Lacher, M.

[5] Ruf, A.

来源：

Dietrich, T.R. | 1993年 / Publ by Institute of Physics Publishing Ltd, Bristol, United Kingdom卷 / 03期

关键词：

Composition - Etching - Fits and tolerances - Lithium compounds - Microscopic examination - Phase transitions - Physical properties - Silicon nitride - Ultraviolet radiation;

D O I：

10.1088/0960-1317/3/4/004

中图分类号：

学科分类号：

摘要：

This paper presents the use of photoetchable glasses in the field of microsystem technology. Its properties make it an ideal material for a wide variety of microsystems. A method to fabricate tips for atomic force microscopy out of this material is proposed. The main advantage of these tips with respect to conventional silicon-based tips is their large aspect ratio. Silicon nitride is used as a material for the cantilevers, which are on top of a glass carrier. The first experimental results are presented.

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