SPUTTERING AND BACKSCATTERING OF keV LIGHT IONS BOMBARDING RANDOM TARGETS.

被引：113

作者：

Weissmann, R. ^{[1
]}

Sigmund, P. ^{[2
]}

机构：

[1] Max-Planck-Institut für Plasmaphysik, EURATOM Association, Garching,BRD-8046, Germany

[2] H. C. ørsted Institute, Copenhagen,DK-2100, Denmark

来源：

Radiation Effects | 1973年 / 19卷 / 01期

关键词：

MATHEMATICAL TECHNIQUES - Integral Equations - Sputtering;

D O I：

10.1080/00337577308232208

中图分类号：

学科分类号：

摘要：

Range and damage distributions have been calculated for light ions slowing down in heavy targets in the energy region where electronic stopping is dominating and approximately proportional to velocity. Following Schiott's approach, well-known integral equations for spatial moments were approximated by differential equations, and the latter solved by numerical integration. From the profiles, backscattering coefficients and relative sputtering yields were determined. Comparison is made with previous theoretical results, computer simulation and experimental results. An improved calculation of the sputtering yield of light ions bombarding a thin film is also presented.

引用

页码：7 / 14