INFLUENCE OF PHOTOELECTRONS AND FLUORESCENCE RADIATION ON RESOLUTION IN X-RAY LITHOGRAPHY.

被引：3

作者：

Chlebek, J. ^{[1
]}

Betz, H. ^{[1
]}

Heuberger, A. ^{[1
]}

Huber, H.-L. ^{[1
]}

机构：

[1] Fraunhofer-Inst fuer, Mikrostrukturktechnik, Berlin, West, Ger, Fraunhofer-Inst fuer Mikrostrukturktechnik, Berlin, West Ger

来源：

Microelectronic Engineering | 1987年 / 6卷 / 1-4期

关键词：

The authors wish to thank Mrs. E. Werner for her support in doing the measurements and in preparing the figures. The work was funded by the Ministry of Research and Technology of the Federal Republic of Germany;

D O I：

10.1016/0167-9317(87)90041-4

中图分类号：

学科分类号：

摘要：

引用

页码：221 / 226