RADIATION DAMAGE IN ORGANIC CRYSTALLINE FILMS.

被引：53

作者：

Fryer, J.R. ^{[1
]}

机构：

[1] Univ of Glasgow, Chemistry Dep,, Glasgow, Scotl, Univ of Glasgow, Chemistry Dep, Glasgow, Scotl

来源：

Ultramicroscopy | 1983年 / 14卷 / 03期

关键词：

ENCAPSULATION OF SPECIMENS - LOCAL INITIATION OF DAMAGE - ORGANIC CRYSTALLINE FILMS;

D O I：

10.1016/0304-3991(84)90091-3

中图分类号：

学科分类号：

摘要：

Evidence from high resolution electron microscopy of phthalocyanines, aromatic, conjugated and aliphatic hydrocarbons is presented to show that the local initiation of structural damage under electron beam irradiation is common to all organic crystals. Electron diffraction of well characterized specimens has shown that the sustainable exposure to radiation in the microscope is a function of specimen thickness. Encapsulation of all specimens with carbon, silicon monoxide or organic layer prolongs the lifetime of the specimen. Halogenated molecules are the most radiation resistant and show greatest effect of encapsulating layers. A mechanism for radiation damage in the microscope is proposed based on bond scission and bond reformation. Halogen additives appear to aid the reformation reaction and thus extend the lifetime of the specimen. 24 refs.

引用

页码：227 / 236