ELECTRON BEAM TESTING OF ULTRA LARGE SCALE INTEGRATED CIRCUITS.

被引：7

作者：

Garth, Simon C.J. ^{[1
]}

机构：

[1] Cambridge Univ, Cambridge, Engl, Cambridge Univ, Cambridge, Engl

来源：

Microelectronic Engineering | 1986年 / 4卷 / 02期

关键词：

ELECTRON BEAMS - Applications - ELECTRON OPTICS - FAILURE ANALYSIS - MICROSCOPIC EXAMINATION - Scanning Electron Microscopy - SPECTROMETERS;

D O I：

10.1016/0167-9317(86)90099-7

中图分类号：

学科分类号：

摘要：

Electron beam testing is finding increasing acceptance within the semiconductor industry as a design analysis tool. In this paper the needs of semiconductor engineers are reviewed. These are then compared with the performance of currently available electron beam test systems as well as with the predicted limitations of the technology. In addition, some recent work is described which has demonstrated superior performance in several ways when compared to current available equipment.

引用

页码：121 / 138