EFFECT OF PRESSURE ON PROPERTIES OF REACTIVELY SPUTTERED TA2O5

被引：40

作者：

WESTWOOD, WD ^{[1
]}

BOYNTON, RJ ^{[1
]}

INGREY, SJ ^{[1
]}

机构：

[1] BELL NO RES,OTTOWA,ONTARIO,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 01期

关键词：

D O I：

10.1116/1.1318629

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：381 / 384

页数：4

共 22 条

[1] REFRACTIVE INDICES OF ZNO ZNS AND SEVERAL THIN-FILM INSULATORS [J].

BURGIEL, JC ;

CHEN, YS ;

VRATNY, F ;

SMOLINSKY, G .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (07) :729-+

[2]

CHENG YL, TO BE PUBLISHED

[3]

CLARKE DJ, 1964, BRIT COMMUN ELECTRON, V11, P176

[4]

CLARKE RS, 1965, IEEE T, VPMP1, P531

[5]

HENSLER DH, 1971, J APPL PHYS, V10, P1037

[6] The Mechanism of Reactive Sputtering [J].

Hollands, E. ;

Campbell, D. S. .

JOURNAL OF MATERIALS SCIENCE, 1968, 3 (05) :544-552

[7] THIN-FILM CAPACITORS USING TANTALUM OXIDE DIELECTRICS PREPARED BY REACTIVE SPUTTERING [J].

LLOYD, P .

SOLID-STATE ELECTRONICS, 1961, 3 (01) :74-75

[8] OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON TANTALUM, NIOBIUM, AND TANTALUM + NIOBIUM ALLOYS, AND THE OPTICAL CONSTANTS OF TANTALUM [J].

MASING, L ;

ORME, JE ;

YOUNG, L .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1961, 108 (05) :428-438

[9] PULVERIZATION AND DEPTH DISTRIBUTION .4. CATHODE PULVERIZATION OF NB205, TA205 AND WO3 OXIDES [J].

NGHI, LQ ;

KELLY, R .

CANADIAN JOURNAL OF PHYSICS, 1970, 48 (02) :137-&

[10]

PRATT IH, 1969, SOLID STATE TECHNOL, V12, P49

← 1 2 3 →