高保真度压印光刻图形质量研究

Fabrication of threedimensional microstructures by soft molding. Kim Y S,Suh K Y,Lee H H. Applied Physics . 2001

Using anelastomeric phase mask for sub-100 nmphotolithography in the optical near field. John A,Rogers,Kateri E,et al. Applied Physics Letters . 1997

Nano-compact disks with400 Gbit/in2 storage density fabricated usingnanoimprint lithography and read with proximalprobe. Peter R K,Chou S Y. Applied Physics Letters . 1997

Testingof a rapid fault detection model for qualitycontrol:Borophosphosilicate glass thin filmsmonitored by infrared absorption spectroscopy. Zhang S,Franke J E,Niemczyk T M,et al. Journal of Vacuum Science and Technology . 1997

Fabrication of5 nm linewidth and 14 nm pitch features bynanoimprint lithography. Austin M D,Ge H X,Wu W,et al. Applied Physics Letters . 2004

Imprint of sub-25 nm vias and trenches in polymers. Chou S Y,Krauss P R,Renstrom P J,et al. Applied Physics . 1995

Fabrication of threedimensional microstructures by soft molding. Kim Y S,Suh K Y,Lee H H. Applied Physics . 2001

Using anelastomeric phase mask for sub-100 nmphotolithography in the optical near field. John A,Rogers,Kateri E,et al. Applied Physics Letters . 1997

Nano-compact disks with400 Gbit/in2 storage density fabricated usingnanoimprint lithography and read with proximalprobe. Peter R K,Chou S Y. Applied Physics Letters . 1997

Testingof a rapid fault detection model for qualitycontrol:Borophosphosilicate glass thin filmsmonitored by infrared absorption spectroscopy. Zhang S,Franke J E,Niemczyk T M,et al. Journal of Vacuum Science and Technology . 1997

Fabrication of5 nm linewidth and 14 nm pitch features bynanoimprint lithography. Austin M D,Ge H X,Wu W,et al. Applied Physics Letters . 2004

Imprint of sub-25 nm vias and trenches in polymers. Chou S Y,Krauss P R,Renstrom P J,et al. Applied Physics . 1995