铝在路易斯酸性1-烯丙基-3甲基米唑氯铝酸离子液体中的低温电沉积(英文)

被引：30

作者：

郑勇 ^{[1
,2
]}

张锁江 ^{[1
]}

吕兴梅 ^{[1
]}

王倩 ^{[1
]}

左勇 ^{[1
]}

刘恋 ^{[1
,2
]}

机构：

[1] Beijing Key Laboratory of Ionic Liquids Clean Process,State Key Laboratory of Multiphase Complex Systems,Institute of Process Engineering,Chinese Academy of Sciences

[2] College of Chemistry and Chemical Engineering,Graduate University of Chinese Academy of Sciences

来源：

Chinese Journal of Chemical Engineering | 2012年 / 20卷 / 01期

关键词：

D O I：

暂无

中图分类号：

O614.31 [];

学科分类号：

摘要：

Lewis acidic 1-allyl-3-methylimidazolium chloroaluminate ionic liquids were used as promising elec-trolytes in the low-temperature electrodeposition of aluminium.Systematic studies on deposition process have been performed by cyclic voltammetry and chronoamperometry.The surface morphology and X-ray diffraction(XRD) patterns of deposits prepared at different experimental conditions were also investigated.It was shown that the nu-cleation density and growth rate of crystallites had a great effect on the structure of aluminium deposited.The crys-tallographic orientation of deposits was mainly influenced by temperature and current density.Smooth,dense and well adherent aluminium coatings were obtained on copper substrates at 10-25 mA?cm?2 and 313.2-353.2 K.More-over,the current efficiency of deposition and purity of aluminium have been significantly improved,demonstrating that the ionic liquids tested have a prospectful potential in electroplating and electrorefining of aluminium.

引用

页码：130 / 139

页数：10

共 9 条

[1]

苯基三甲基氯化铵（TMPAC）–三氯化铝（AlCl）离子液体+苯的电镀铝研究 [J].

柳泉 ;

刘奎仁 ;

韩庆 ;

涂赣峰 .

中国表面工程, 2010, (06) :34-39

[2]

Electrodeposition of aluminum from molten AlCl_3-NaCl-KCl mixture.[J].M. Jafarian;M. G. Mahjani;F. Gobal;I. Danaee.Journal of Applied Electrochemistry.2006, 10

[3]

Electroplating of mild steel by aluminium in a first generation ionic liquid: A green alternative to commercial Al-plating in organic solvents.[J].Q.X. Liu;S. Zein El Abedin;F. Endres.Surface & Coatings Technology.2006, 3

[4]

Additive free electrodeposition of nanocrystalline aluminium in a water and air stable ionic liquid [J].

El Abedin, SZ ;

Moustafa, EM ;

Hempelmann, R ;

Natter, H ;

Endres, F .

ELECTROCHEMISTRY COMMUNICATIONS, 2005, 7 (11) :1111-1116

[5]

New Electrolytes for Aluminum Production: Ionic Liquids.[J].Mingming Zhang;Venkat Kamavarum;Ramana G. Reddy.JOM.2003, 11

[6]

Ionic liquids: Solvents for the electrodeposition of metals and semiconductors [J].

Endres, F .

CHEMPHYSCHEM, 2002, 3 (02) :144-+

[7]

Crystallisation and electrical resistivity of sputter-deposited aluminium–germanium alloy films.[J].A Boogaard;J.J van den Broek.Thin Solid Films.2001, 1

[8]

Electrodeposition of aluminium and aluminium/platinum alloys from AlCl<Subscript>3</Subscript>/benzyltrimethylammonium chloride room temperature ionic liquids.[J].Andrew P. Abbott;Christopher A. Eardley;Nicola R.S. Farley;Gerald A. Griffith;Allin Pratt.Journal of Applied Electrochemistry.2001, 12

[9]

Texture and surface roughness of PRCVD aluminum films.[J].D. Yang;R. Jonnalagadda;B.R. Rogers;J.T. Hillman;R.F. Foster;T.S. Cale.Thin Solid Films.1998, 1

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