利用三步法MOCVD生长器件质量的GaN

被引:4
作者
刘宝林
机构
[1] 厦门大学物理系福建厦门
关键词
GaN; MOCVD; 原子层外延; 三步外延; 器件质量; AlN;
D O I
10.16818/j.issn1001-5868.2001.06.015
中图分类号
TN304.055 [];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
在传统的二步MOCVD外延生长的基础上 ,报道了一种在低压MOCVD中用三步外延生长GaN材料的新方法 ,它在生长低温缓冲层前 ,用原子层的方法生长一层高质量的AlN层来减少Al2 O3与GaN缓冲层之间的应力以提高缓冲层的质量 ,从而提高外延层GaN的质量 ,达到器件制作的要求
引用
收藏
页码:428 / 432
页数:5
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