离子束增强沉积工艺对镀层表面粗糙度的影响

被引:1
作者
唐宾
秦林
朱晓东
徐重
机构
[1] 太原理工大学表面工程研究所!太原 西安交通大学金属材料强度国家重点实验室
[2] 西安
[3] 太原理工大学表面工程研究所!太原
[4] 西安交通大学金属材料强度国家重点实验室!西安
关键词
离子束增强沉积; 粗糙度; 结合强度; 氮化钛;
D O I
10.19476/j.ysxb.1004.0609.2000.s1.042
中图分类号
TG17 [金属腐蚀与保护、金属表面处理];
学科分类号
080503 ;
摘要
研究了不同界面共混工艺对精密轴承镀层表面粗糙度的影响。结果表明 ,用氮离子进行界面反冲共混 ,在动态反冲共混过程中 ,随着氮离子能量的增高 ,氮离子选择溅射和界面碳富集造成界面上沉积的镀层表面粗糙度相应增大 ,而对于在工件表面预先沉积一层纯钛的静态反冲共混工艺 ,镀层具有较低的表面粗糙度。当氮离子能量为 40keV时 ,静态反冲共混界面具有高的镀膜基体结合力。
引用
收藏
页码:184 / 187
页数:4
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