具有痕量钴掺杂且暴露更多边缘活性的N,P共掺杂的多孔碳纳米片作为高效氧还原催化剂（英文）

被引：12

作者：

严大峰 ^{[1
]}

郭兰 ^{[1
]}

谢超 ^{[1
]}

王燕勇 ^{[1
]}

李云霄 ^{[1
]}

李浩 ^{[1
]}

王双印 ^{[1
,2
,3
]}

机构：

[1] State Key Laboratory of Chem/Bio-Sensing and Chemometrics, Provincial Hunan Key Laboratory for Graphene Materials and Devices, College of Chemistry and Chemical Engineering, Hunan University

[2] Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, Shenzhen University

[3] Shenzhen Research Institute of Hunan

来源：

Science China Materials | 2018年 / 61卷 / 05期

关键词：

electrocatalysts; oxygen reduction reaction; dual-doping; Co–N–C; edge exposed;

D O I：

暂无

中图分类号：

O643.36 [催化剂]; TB383.1 [];

学科分类号：

摘要：

本文使用有机分子配位聚合作用一步聚合、碳化、酸洗得到了一种N,P双掺杂碳材料.其具有痕量掺杂的金属钴、且具有更多活性边缘.X射线光电子能谱显示杂原子成功进入碳材料当中,并且发现酸洗后钴的信号非常低,证明酸洗后,材料表面形成非常多的孔,暴露出更多的边缘催化位点.制备的碳材料具有大量催化活性位点,因此表现出极其优异的电催化氧还原性能.另外,与Pt/C相比,制备的多孔碳材料还具有较好的抗毒性与稳定性,进一步显示了其在新能源电池领域的应用前景.

引用

页码：679 / 685

页数：7

共 15 条

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