特征分析视角下核心技术动态趋势识别——以光刻技术为例

被引：25

作者：

杨武

王爽

机构：

[1] 北京科技大学经济管理学院

来源：

情报杂志 | 2021年 / 40卷 / 12期

关键词：

技术核心特征; 核心技术识别; 技术动态趋势; 光刻技术; 技术网络可视化;

D O I：

暂无

中图分类号：

TN305.7 [光刻、掩膜]; G353.1 [情报资料的分析和研究];

学科分类号：

1401 ; 1205 ;

摘要：

[研究目的]核心技术动态趋势的识别是技术创新的重要环节。本研究有利于为技术创新决策提供科学支撑。[研究方法]从技术核心特征分析视角出发,运用专利指标和合成指数法,构建核心特征测度指标模型和测度指数,结合聚类方法和网络可视化分析,分三个时期,对光刻核心技术动态趋势进行识别分析。[研究结论]光刻核心技术主要聚焦在图纹面的照相制版工艺,半导体器件,光学元件、系统或仪器和摄影、放映或观看用的装置或设备,其在2001-2020年间均保持了较高的核心性;2007-2013年光刻核心技术结构出现较大变动,纳米结构的应用成为核心技术;2014-2020年光刻技术整体上处于技术深化期,核心技术结构进一步稳固;此外,光刻技术之间存在核心-边缘结构特征,核心技术彼此之间关联较强,并与边缘技术相关联,而边缘技术彼此之间关联性较弱。

引用

页码：36 / 44

页数：9

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