用脉冲激光沉积方法制备氮化铝薄膜

被引:6
作者
凌浩
施维
孙剑
应质峰
吴嘉达
李富铭
王康林
丁训民
机构
[1] 复旦大学三束材料改性国家重点实验室!上海
[2] 复旦大学三束材料改性国家
关键词
脉冲激光沉积; 氮化铝; 激光烧蚀;
D O I
暂无
中图分类号
O484.1 [薄膜的生长、结构和外延];
学科分类号
摘要
介绍了用脉冲激光沉积 (PLD)方法制备AlN薄膜的工作 ,在Si(10 0 )衬底上得到了光滑平整、透明度高的AlN薄膜 ,由实验结果拟合得到能隙宽度为 5 7eV。考察了衬底温度和退火温度的影响。
引用
收藏
页码:272 / 274
页数:3
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