掺Yb相移光纤光栅形成过程的分析

被引:4
作者
陈嘉琳
陈柏
乔启全
范薇
李学春
陈兰荣
薛绍林
林尊琪
文双春
机构
[1] 中国科学院上海光学精密机械研究所高功率激光物理国家实验室
[2] 湖南大学通信与电子工程系 上海
[3] 上海
[4] 湖南长沙
关键词
光电子学; 掺Yb; 相移光纤光栅; 二次曝光法; 次峰;
D O I
暂无
中图分类号
TN253 [光纤元件];
学科分类号
0702 ; 070207 ;
摘要
研究了用二次曝光法制作掺Yb相移光纤光栅的实验过程 ,并对相移光纤光栅制作过程中出现次峰的情况进行了理论分析。合理地解释了该现象
引用
收藏
页码:541 / 544
页数:4
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