Research of multilayers in EUV, soft X-ray and X-ray

To develop beam splitters for soft X-ray laser Michelson interferometer at 13.9 nm, Mo/Si multilayers of 100 nm thickness deposited on both sides of silicon nitride were fabricated by using DC magnetron sputtering. Initial evaluation of their reflectivity and transmission showed that reflectivity and transmission were above 10% and 25%. The broadband analyzers have been designed, fabricated and characterized for 13～20 nm polarization measurements. The measured results are in good agreement with the design. The supermirrors with different angular intervals at 0.154 nm have been designed, fabricated and characterized.