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oldham and Richard E.Schenlce.193nm lithography system lifetimre as limited by UVcompaction. William G. Solid State Technology . 1997
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A new align-ment system for submicron stepper. S.Uzawa,A.Suzuki,N.Ayata. Proceedings of SPIE the International Society for Optical Engineering . 1990
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3μm Optical lithography Using a phase-shftingmask. T.Terasawa,N Hasegawa,H. Fukuda etal. Proceedings of SPIE the International Society for Optical Engineering . 1989
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A highperformance antireflection layer for the current and fu-ture optical lithography. T.Ogawa,H. Nakano,T. Gocho et al. Proceedings of SPIE the International Society for Optical Engineering . 1994