离焦激光直写光刻工艺研究

被引:16
作者
李凤友
卢振武
谢永军
张殿文
裴苏
赵晶丽
机构
[1] 中国科学院长春光学精密机械和物理研究所应用光学国家重点实验室
[2] 中国科学院长春光学精密机械和物理研究所应用光学国家重点实验室 吉林长春
[3] 吉林长春
[4] 吉林长春
关键词
激光直写光刻; 离焦写入; 四轴激光直写系统;
D O I
暂无
中图分类号
TN305.7 [光刻、掩膜];
学科分类号
摘要
采用理论计算和光线追迹分析了激光直写光刻中离焦对写入焦斑光场分布的影响;使用四轴激光直写设备开展了离焦激光直写光刻工艺实验,实验和理论计算及光线追迹的结果吻合得很好。利用离焦激光直写光刻方法制作了光栅和分划版,测得实验结果达到工艺要求。
引用
收藏
页码:850 / 854
页数:5
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