[1]
Plasma parameter measurements and deposition of a-Si: H thin films in pulsed ECR plasma Surface and coatings. Itagaui N,Fuliucla A,Yoshizawa T. et al. Journal of Vacuum Science and Technology . 2000
[1]
Plasma parameter measurements and deposition of a-Si: H thin films in pulsed ECR plasma Surface and coatings. Itagaui N,Fuliucla A,Yoshizawa T. et al. Journal of Vacuum Science and Technology . 2000