Investigation of CVD molybdenum oxide films

被引：53

作者：

Ivanova, T

Surtchev, M

Gesheva, K

机构：

[1] Bulgarian Acad Sci, Cent Lab Solar Energy & New Energy Sources, Sofia 1784, Bulgaria

[2] Sofia Univ, Fac Phys, Sofia, Bulgaria

来源：

MATERIALS LETTERS | 2002年 / 53卷 / 4-5期

关键词：

CVD method; molybdenum oxide; XRD analysis; optical properties;

D O I：

10.1016/S0167-577X(01)00486-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thin films of molybdenum oxide were obtained by atmospheric pressure Chemical Vapor Deposition (CVD) method at two deposition temperatures of 150 and 200 degreesC. The precursor used was MO(CO)(6) in Air + O-2 atmosphere. The films were deposited on different substrates (Si wafer, glass and conductive SnO2:Sb covered glass) and showed good adhesion. They were characterized by XRD measurements, IR spectroscopy, Transmission Electron Microscopy (TEM) and UV-VIS spectroscopy. The coatings were uniform and had a good optical behavior with 70-80% transmittance in the visible region. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：250 / 257

页数：8

共 14 条

[1] Iteratively derived optical constants of MoO3 polycrystalline thin films prepared by CVD [J].