Laser ablation synthesis and characterization of nitride coatings

Thin film nitride coatings were deposited on Si (100) substrates by the pulsed laser deposition (PLD) technique. The PLD method is a unique process for depositing high quality thin films with novel microstructure and properties. Boron nitride (BN) films deposited on Si (100) substrates have a higher percentage of c-BN phases when processed in higher nitrogen partial pressure, Titanium nitride films deposited on Si (100) substrates at a higher temperature (600 degrees C) have better quality crystallinity and higher hardness and Young's modulus values than films deposited at lower temperatures. Nanoindentation technique was used to measure the mechanical properties of thin films. The film orientation was determined by x-ray diffraction, Atomic force microscopy (AFM) technique was used to understand the growth structure of the films.