Analysis of vaporization kinetics of group-III nitrides

被引：23

作者：

Averyanova, MV

Przhevalskii, IN

Karpov, SY

Makarov, YN

Ramm, MS

Talalaev, RA

机构：

[1] UNIV ERLANGEN NURNBERG,FLUID MECH DEPT,D-91058 ERLANGEN,GERMANY

[2] RUSSIAN RES CTR APPL CHEM,ST PETERSBURG 197198,RUSSIA

[3] CTR ADV TECHNOL,ST PETERSBURG 194156,RUSSIA

[4] AF IOFFE PHYS TECH INST,ST PETERSBURG 194021,RUSSIA

来源：

MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1997年 / 43卷 / 1-3期

关键词：

nitrides; thermodynamic properties; evaporation;

D O I：

10.1016/S0921-5107(96)01856-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

On the basis of experimental data on Knudsen and Langmuir evaporation of group-III nitrides, the role of surface kinetics is analyzed. Different behavior of nitrides compared with other III-V compounds is assumed to originate from the existence of a significant kinetic barrier for adsorption/desorption of molecular nitrogen. Thermodynamic properties of GaN, AlN and InN are refined and evaporation/condensation coefficients of these compounds are obtained as functions of temperature. The trends in nitrides vaporization are analyzed using a model accounting for the kinetics of the evaporation process. The theoretical predictions are compared with those available in the literature experimental data.

引用

页码：167 / 171

页数：5

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