Optical properties of δ-Bi2O3 thin films grown by reactive sputtering -: art. no. 231916

被引：120

作者：

Fan, HT ^{[1
]}

Teng, XM ^{[1
]}

Pan, SS ^{[1
]}

Ye, C ^{[1
]}

Li, GH ^{[1
]}

Zhang, LD ^{[1
]}

机构：

[1] Chinese Acad Sci, Inst Solid State Phys, Anhui Key Lab Nanomat & Nanotechnol, Key Lab Mat Phys, Hefei 230031, Peoples R China

来源：

APPLIED PHYSICS LETTERS | 2005年 / 87卷 / 23期

关键词：

D O I：

10.1063/1.2136351

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The optical properties of delta-Bi2O3 thin films were investigated using spectroscopic ellipsometry and optical absorption spectrum. delta-Bi2O3 thin films were grown on Si and quartz substrates under different oxygen flow ratios (OFR) by radio frequency reactive magnetron sputtering. The Tauc-Lorentz dispersion method was adopted to model the optical dispersion functions of the thin films. The optical bandgap was obtained by three different methods. It was found that refractive index and extinction coefficient decrease, and the optical bandgap has a slight blue shift with increasing the OFR. Factors influencing the optical constants and optical bandgap are discussed. (c) 2005 Americian Institute of Physics.

引用

页码：1 / 3

页数：3

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