Low-energy ion-beam-assisted deposition and GMR of granular magnetic alloys

被引：7

作者：

Guilfoyle, SJ

Pollard, RJ

Grundy, PJ

机构：

[1] Joule Laboratory, Department of Physics, University of Salford

[2] Dept. of Pure and Applied Physics, Queen's University of Belfast

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1996年 / 29卷 / 01期

关键词：

D O I：

10.1088/0022-3727/29/1/006

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Granular Co-Ag and NiFe-Ag thin films were prepared by magnetron sputtering with low-energy (0-500 eV) ion radiation assisted deposition. For sputter-only films the giant magnetoresistance (GMR) ratio varied with composition, with a peak occurring at about 35 at.% magnetic component. The ion beam was found to increase the GMR slightly with increasing energy and then progressively decrease it. There was an accompanying decrease in film thickness and Ag concentration as the ion beam preferentially sputtered the Ag. TEM has revealed sputtered films to contain ordered 10-20 nm spherical particles whilst the ion-beam-assisted films were made up of a network of particles clustered into channels.

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页码：29 / 33

页数：5

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