Simulation of reflective notching with TEMPEST

被引:1
作者
Pistor, T
Neureuther, AR
机构
来源
OPTICAL MICROLITHOGRAPHY X | 1997年 / 3051卷
关键词
D O I
10.1117/12.276039
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Reflective notching from projection printing a narrow feature over a reflective topography was simulated with the 3D electromagnetic simulation program TEMPEST[1]. Various topographical and optical parameters were varied to determine their effect on the reflective notching and to gain insight into the mechanism of reflective notching. It was determined that corner angles in the topography and anti-reflection coating use are important parameters while resist surface angle and polarization are not.
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页码:595 / 605
页数:5
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