Correlation between surface and bulk phenomena in the process of thin palladium hydride and titanium hydride film formation

被引：8

作者：

Nowicka, E

机构：

来源：

VACUUM | 1997年 / 48卷 / 3-4期

关键词：

D O I：

10.1016/S0042-207X(96)00255-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The measurements of surface potential SP and resistance changes Delta R of thin Pd and Ti films in the process of PdHx(x = 1) and TiHy(y = 2) hydride formation were performed. SP measurements allow differentiation between various forms of hydrogen adspecies. The influence of these forms of the adsorbate on the resistance are determined and discussed. (C) 1997 Elsevier Science Ltd.

引用

页码：199 / 202

页数：4

共 17 条

[1]

ALEFELD G, 1978, TOPICS APPLIED PHYSI, V29

[2] ELECTRONIC PROPERTIES OF HYDRIDES OF TI-H AND ZR-H SYSTEMS [J].