Interaction of H, O and OH with metal surfaces

被引:174
作者
Koper, MTM [1 ]
van Santen, RA [1 ]
机构
[1] Eindhoven Univ Technol, Inorgan Chem & Catalysis Lab, Schuit Inst Catalysis, NL-5600 MB Eindhoven, Netherlands
关键词
metal surfaces; water; dissociation products;
D O I
10.1016/S0022-0728(99)00291-0
中图分类号
O65 [分析化学];
学科分类号
070302 [分析化学]; 081704 [应用化学];
摘要
The interaction of the primary water dissociation products H, O and OH with various (111) metal surfaces is studied by density functional theory (DFT) calculations using clusters. It is found that H forms an essentially covalent bond with the metal, whereas O and OH form a largely ionic bond. The O and OH adsorbates prefer the high coordination three-fold hollow site on all metals: no such clear trend for H is found, the adsorption energy for on-top and hollow sites being comparable for most metals, especially on transition metals. The O and OH adsorbates are attracted towards, and donate some electronic charge to the surface when a positive electric field (electrode potential) is applied, whereas the effect of an applied field on H adsorption is much smaller. We also show how the trends in the OH adsorption energies on different metals, as compared with O adsorption, can be explained by a weaker covalent interaction and a stronger Pauli repulsion of the OH with the metal d electrons. (C) 1999 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:126 / 136
页数:11
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