Current and voltage noise in WO3 nanoparticle films

被引:22
作者
Hoel, A
Vandamme, LKJ
Kish, LB
Olsson, E
机构
[1] Univ Uppsala, Angstrom Lab, Dept Mat Sci, S-75121 Uppsala, Sweden
[2] Tech Univ Eindhoven, Dept Elect Engn E H 5 15, Eindhoven, Netherlands
关键词
D O I
10.1063/1.1423398
中图分类号
O59 [应用物理学];
学科分类号
摘要
Current and voltage noise measurements have been carried out on nanoparticle WO3 films. The fluctuation dissipation theorem holds, which indicates that the observed noise is an equilibrium phenomenon. Results on the thinnest films show that noise measurements can be used for quality assessment of nanocrystalline insulating films. (C) 2002 American Institute of Physics.
引用
收藏
页码:5221 / 5226
页数:6
相关论文
共 17 条
[1]  
[Anonymous], 1997, ULTRAFINE PARTICLES
[2]   1/F NOISE IN PLATINUM FILMS AND ULTRATHIN PLATINUM WIRES - EVIDENCE FOR A COMMON, BULK ORIGIN [J].
FLEETWOOD, DM ;
MASDEN, JT ;
GIORDANO, N .
PHYSICAL REVIEW LETTERS, 1983, 50 (06) :450-453
[3]  
Gleiter H., 1992, Nanostructured Materials, V1, P1, DOI 10.1016/0965-9773(92)90045-Y
[4]  
Granqvist C. G., 1995, HDB INORGANIC ELECTR
[5]   ULTRAFINE METAL PARTICLES [J].
GRANQVIST, CG ;
BUHRMAN, RA .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) :2200-2219
[6]  
Green F, 2000, AIP CONF PROC, V511, P422, DOI 10.1063/1.59993
[7]  
Hoel A, 2000, MATER RES SOC SYMP P, V581, P15
[8]  
HOEL A, 1999, P 51 ANN M SCAND SOC, P51
[9]   EXPERIMENTAL STUDIES ON 1-F NOISE [J].
HOOGE, FN ;
KLEINPENNING, TGM ;
VANDAMME, LKJ .
REPORTS ON PROGRESS IN PHYSICS, 1981, 44 (05) :479-532
[10]   1/F NOISE IS NO SURFACE EFFECT [J].
HOOGE, FN .
PHYSICS LETTERS A, 1969, A 29 (03) :139-&