Characterisation of the properties of surface-treated indium-tin oxide thin films

被引：58

作者：

Kim, JS

Cacialli, F

Granström, M

Friend, RH

Johansson, N

Salaneck, WR

Daik, R

Feast, WJ

机构：

[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England

[2] Linkoping Univ, IFM, Dept Phys, S-51883 Linkoping, Sweden

[3] Univ Durham, IRC Polymer Sci & Technol, Durham DH1 3LE, England

来源：

SYNTHETIC METALS | 1999年 / 101卷 / 1-3期

关键词：

ITO; oxygen plasma; polarity; workfunction; PL quenching;

D O I：

10.1016/S0379-6779(98)01127-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We studied the surface properties of indium-tin oxide (ITO) modified by wet (aquaregia, ultrasonication, RCA) and dry (oxygen and argon plasmas) treatments. The influence of surface treatment on ITO was investigated by surface energy, surface roughness, sheet resistance, and workfunction measurements. We report that oxygen plasma treatment induces: (1) the highest surface energy with the highest polarity. (2) the smoothest surface, (3) the lowest sheet resistance, and (4) the highest workfunction. We also observe that the PL efficiencies of PPV, PDPV and PEDOT/PPV on ITO are affected by the surface treatment of ITO.

引用

页码：111 / 112

页数：2