Interstitial carbon in copper: electronic and mechanical properties

被引:32
作者
Ellis, DE [1 ]
Mundim, KC
Fuks, D
Dorfman, S
Berner, A
机构
[1] Northwestern Univ, Dept Phys & Astron, Evanston, IL 60208 USA
[2] Northwestern Univ, Mat Res Ctr, Evanston, IL 60208 USA
[3] Ben Gurion Univ Negev, Dept Mat Engn, IL-84105 Beer Sheva, Israel
[4] Technion Israel Inst Technol, Dept Phys, IL-32000 Haifa, Israel
[5] Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel
来源
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1999年 / 79卷 / 10期
基金
美国国家科学基金会;
关键词
D O I
10.1080/13642819908218326
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of interstitial carbon on the electronic and: mechanical properties of copper are studied theoretically. Semiempirical methodology, atomistic simulations and first-principles density-functional embedded-cluster schemes are combined to extract some understanding of the diffusion: process and related degradation of Cu-C composite materials under extremes of temperature and stress. High-resolution scanning electron microscopy results are presented, which demonstrate the existence of a solid solution zone at the Cu-C interface.
引用
收藏
页码:1615 / 1630
页数:16
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