Very low dark current metal-semiconductor-metal ultraviolet photodetectors fabricated on single-crystal GaN epitaxial layers

被引:108
作者
Carrano, JC
Grudowski, PA
Eiting, CJ
Dupuis, RD
Campbell, JC
机构
[1] Dept. of Elec. and Comp. Engineering, Microelectronics Research Center, University of Texas at Austin, Austin
关键词
D O I
10.1063/1.118777
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report a very low dark current (similar to 57 pA at 10 V reverse bias) metal-semiconductor-metal photodetectors fabricated on GaN epitaxial layers grown by low-pressure metalorganic chemical vapor deposition. The photodetectors exhibit the typical sharp band-edge cutoff, with good responsivity. There is indication of a photoconductive gain mechanism. We also performed a Medici simulation to establish an effective area for current density calculations. (C) 1997 American Institute of Physics.
引用
收藏
页码:1992 / 1994
页数:3
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