Vapor deposition of polyimide: segregation of partially reacted species at the polyimide Si (100) interface

被引：8

作者：

Liberman, V ^{[1
]}

Malba, V ^{[1
]}

Bernhart, AF ^{[1
]}

机构：

[1] LAWRENCE LIVERMORE NATL LAB,LIVERMORE,CA 94550

来源：

THIN SOLID FILMS | 1997年 / 305卷 / 1-2期

关键词：

deposition process; Fourier transform infrared spectroscopy; adhesion; polymers;

D O I：

10.1016/S0040-6090(97)00117-X

中图分类号：

T [工业技术];

学科分类号：

08 [工学];

摘要：

We examined the vapor deposition of polyimide produced by co-evaporation of pyromellitic dianhydride and oxydianiline. Using internal reflectance spectroscopy and prism coupling techniques, we monitored the effects of varying relative monomer fluxes on cured film stoichiometry. We observed the effects of monomer interdiffusion during the ex-situ curing leading to segregation of partially reacted species at the film/substrate interface. Such interface segregation may be influential in determining adhesion of polyimide to metal layers for microelectronics applications. (C) 1997 Elsevier Science S.A.

引用

页码：26 / 29

页数：4

共 10 条

[1]

A kinetic study of the mechanism of the solid-state reaction between pyromellitic dianhydride (PMDA) and oxydianiline (ODA) [J].