Coalescence inhibition in nanosized titania films and related effects on chemoresistive properties towards ethanol

被引:18
作者
Ferroni, M
Guidi, V
Martinelli, G
Roncarati, G
Comini, E
Sberveglieri, G
Vomiero, A
Mea, GD
机构
[1] INFM, I-44100 Ferrara, Italy
[2] Dipartimento Fis, I-44100 Ferrara, Italy
[3] Ist Nazl Fis Nucl, Sez Ferrara, I-44100 Ferrara, Italy
[4] INFM, I-25133 Brescia, Italy
[5] Dipartimento Chim & Fis Ingn Mat, I-25133 Brescia, Italy
[6] Ist Nazl Fis Nucl, Lab Nazl Legnaro, I-35020 Legnaro, Pd, Italy
[7] Univ Trent, Dipartimento Ingn Mat, I-38050 Trent, Italy
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2002年 / 20卷 / 02期
关键词
D O I
10.1116/1.1450594
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Achievement of nanosized thin films of titania was achieved by radio-frequency sputtering of a Ti(97%)-Mo(3%) target. Deposition was performed under inert or reactive atmosphere followed by annealing at temperatures up to 800 degreesC. The resulting layers became more stoichiometric as annealing temperature increased. The small part of Mo proved useful to prevent exaggerated grain coalescence. Reactive sputtering was more effective than inert deposition to achieve a nanograined layer with lowest size (31 nm). Mo segregated at the surface and partially sublimated as MoO3. The layers became n-doped semiconductors and were tested as chemoresistive gas sensors. Good capability to sense ethanol was determined within a range useful for applications. A model was proposed to explain the response to ethanol. (C) 2002 American Vacuum Society.
引用
收藏
页码:523 / 530
页数:8
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