Increasing the resistivity of electrodeposited high BS CoNiFe thin film

被引：27

作者：

Yokoshima, T ^{[1
]}

Kaseda, M ^{[1
]}

Yamada, M ^{[1
]}

Nakanishi, T ^{[1
]}

Momma, T ^{[1
]}

Osaka, T ^{[1
]}

机构：

[1] Waseda Univ, Sch Sci & Engn, Dept Appl Chem, Kagami Mem Lab Mat Sci & Technol,Shinjuku Ku, Tokyo 1698555, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1999年 / 35卷 / 05期

基金：

日本学术振兴会;

关键词：

soft magnetic thin film; high B-s; high resistivity; electrodeposition;

D O I：

10.1109/20.800871

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In order to increase the resistivity of electrodeposited high B-S CoNiFe thin film, the effect of an organic additive such as diethylenetriamine (DET) added to the plating bath was investigated. The values of rho and H-C were gradually increased as a function of DET concentration. The desirable soft magnetic CoNiFe thin film with rho = 25-90 mu Omega-cm under the conditions of B-S > 1.9 T and H-C < 2.5 Oe was developed as function of carbon in the deposited films. Additionally, the high resistivity CoNiFe thin film with rho = 130 mu Omega-cm was established under the conditions of B-S = 1.7 T and H-C < 6 Oe.

引用

页码：2499 / 2501

页数：3

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