Crack detection and analyses using resonance ultrasonic vibrations in full-size crystalline silicon wafers

被引:2
作者
Belyaev, A
Polupan, O
Dallas, W
Ostapenko, S
Hess, D
Wohlgemuth, J
机构
[1] Univ S Florida, Tampa, FL 33620 USA
[2] BP Solar Int Inc, Frederick, MD 21703 USA
来源
GETTERING AND DEFECT ENGINEERING IN SEMICONDUCTOR TECHNOLOGY XI | 2005年 / 108-109卷
关键词
resonance vibrations; silicon wafer; crack;
D O I
10.4028/www.scientific.net/SSP.108-109.509
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An experimental approach for fast crack detection and length determination in full-size solar-grade crystalline silicon wafers using a Resonance Ultrasonic Vibrations (RUV) technique is presented. The RUV method is based on excitation of the longitudinal ultrasonic vibrations in full-size wafers. Using an external piezoelectric transducer combined with a high sensitivity ultrasonic probe and computer controlled data acquisition system, real-time frequency response analysis can be accomplished. On a set of identical crystalline Si wafers with artificially introduced periphery cracks, it was demonstrated that the crack results in a frequency shift in a selected RUV peak to a lower frequency and increases the resonance peak band width. Both characteristics were found to increase with the length of the crack. The frequency shift and bandwidth serve as reliable indicators of the crack appearance in silicon wafers and are suitable for mechanical quality control and fast wafer inspection.
引用
收藏
页码:509 / 513
页数:5
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