Electrodeposition of metals and semiconductors in air- and water-stable ionic liquids

被引：215

作者：

El Abedin, SZ ^{[1
]}

Endres, F ^{[1
]}

机构：

[1] Tech Univ Clausthal, Fac Nat & Mat Sci, D-38678 Clausthal Zellerfeld, Germany

来源：

CHEMPHYSCHEM | 2006年 / 7卷 / 01期

关键词：

electrochemistry; ionic liquids; metals; semiconductors; solvents;

D O I：

10.1002/cphc.200500288

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In addition to their stability, the advantages of air- and water-stable ionic liquids over chloroaluminate ionic liquids, which were intensively investigated in the post, ore that they ore easy to dry, purify, and handle. Moreover, some of these ionic liquids have an extremely large electrochemical window of more than 5 V, and hence they give access to the electrodeposition of many metals and semiconductors, such as To, Ti, Si, and Ge. The results to date for the electrodeposition of metals and semiconductors in the most popular air- and water-stable ionic liquids are presented.

引用

页码：58 / 61

页数：4

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