Optical gain at 1.54 μm in erbium-doped silicon nanocluster sensitized waveguide

被引:173
作者
Han, HS [1 ]
Seo, SY [1 ]
Shin, JH [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
关键词
D O I
10.1063/1.1419035
中图分类号
O59 [应用物理学];
学科分类号
摘要
Optical gain at 1.54 mum in erbium-doped silicon-rich silicon oxide (SRSO) is demonstrated. Er-doped SRSO thin film was fabricated by electron-cyclotron resonance enhanced chemical vapor deposition of silicon suboxide with concurrent sputtering of erbium followed by a 5 min anneal at 1000 degreesC. Ridge-type single mode waveguides were fabricated by wet chemical etching. Optical gain of 4 dB/cm of an externally coupled signal at 1.54 mum is observed when the Er is excited via carriers generated in the Si nanoclusters by the 477 nm line of an Ar laser incident on the top of the waveguide at a pump power of 1.5 W cm(-2). (C) 2001 American Institute of Physics.
引用
收藏
页码:4568 / 4570
页数:3
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