High-quality MgB2 films on boron crystals with onset Tc of 41.7 K

被引:35
作者
Hur, N
Sharma, PA
Guha, S
Cieplak, MZ
Werder, DJ
Horibe, Y
Chen, CH
Cheong, SW
机构
[1] Rutgers State Univ, Dept Phys & Astron, Piscataway, NJ 08854 USA
[2] Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1427157
中图分类号
O59 [应用物理学];
学科分类号
摘要
The simple binary compound, MgB2, has created enormous excitement, due to its remarkably high T-c (39 K), its exotic electronic and phononic structure, as well as its potential technological application. However, contrary to the initial expectation, worldwide efforts to enhance the T-c of this material by means of chemical doping and applying hydrostatic pressure have failed. Investigations of other diborides or related materials have also resulted in finding of lower T-c's. In this letter we report a slight, but significant enhancement of T-c in MgB2 films grown on boron crystals, which may stem from tensile-type strain. This finding opens up a new possibility for further optimizing T-c in MgB2 and perhaps in related materials. (C) 2001 American Institute of Physics.
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页码:4180 / 4182
页数:3
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