Thickness dependence of the hydrogen solubility in epitaxial Nb(110) films grown on Al2O3(11.0) substrates

被引：10

作者：

Abromeit, A

Siebrecht, R

Song, G

Zabel, H

Klose, F

Nagengast, D

Weidinger, A

机构：

[1] RUHR UNIV BOCHUM,INST FESTKORPERPHYS,D-44780 BOCHUM,GERMANY

[2] HAHN MEITNER INST BERLIN GMBH,D-14109 BERLIN,GERMANY

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 1997年 / 253卷

关键词：

epitaxy; thin films; X-ray scattering isotherms; Nb films;

D O I：

10.1016/S0925-8388(96)02972-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Hydrogen solubility isotherms of thin epitaxial Nb(110) films were measured via in-situ X-ray Bragg scattering. The lattice parameters were converted to H-concentrations through additional neutron reflectivity measurements on the same samples at specific points on the isotherms. The isotherms depend strongly on the film thickness, as regards the slope in the plateau region and the saturation concentration.

引用

页码：58 / 61

页数：4

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