Fabricating three-dimensional polymeric photonic structures by multi-beam interference lithography

被引：150

作者：

Moon, JH ^{[1
]}

Ford, J ^{[1
]}

Yang, S ^{[1
]}

机构：

[1] Univ Penn, Dept Mat Sci & Engn, Philadelphia, PA 19104 USA

来源：

POLYMERS FOR ADVANCED TECHNOLOGIES | 2006年 / 17卷 / 02期

关键词：

photoresists; interference lithography; microstructures; photochemistry; fabrication;

D O I：

10.1002/pat.663

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defect-free over a large area. This review discusses the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative-tone and positive-tone photoresists, organic-inorganic hybrids, hydrogels, and holographic polymer-dispersed liquid crystals. Copyright (c) 2006 John Wiley & Sons, Ltd.

引用

页码：83 / 93

页数：11

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