Spatial distribution of N-2 and NO desorbing from a Rh(533) surface

被引:18
作者
Ikai, M
Janssen, NMH
Nieuwenhuys, BE
Tanaka, K
机构
[1] UNIV TOKYO, INST SOLID STATE PHYS, MINATO KU, TOKYO 106, JAPAN
[2] LEIDEN UNIV, LEIDEN INST CHEM, GORLAEUS LABS, NL-2300 RA LEIDEN, NETHERLANDS
关键词
D O I
10.1063/1.473196
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The spatial distribution of N-2 and NO desorbing from Rh(533), Rh(S)-[4(111)x(100)], was measured along the [<6(5)over bar>(5) over bar] direction (along the steps) after adsorption of NO at 320 K. The N-2 desorption at 450 K and 600 K showed a specific spatial distribution, that is, there was no peak either normal to the (111) terraces (theta=+14.4 degrees) or normal to the (100) steps (theta=-40.3 degrees), but a desorption maximum around theta=-15 degrees. Integrated TPD spectra of N-2 from the NO preadsorbed Rh(533) surface were very similar to those on Rh(111), but the spatial distribution of N-2 from Rh(533) indicates desorption of N-2 from the boundary between the (111) terraces and the vacant (100) steps. The spatial distribution of NO desorbing from the Rh(533) surface at 420 K obeyed (1.5)theta, indicative of desorption normal to the crystal surface. Contrary to this, the spatial cos distribution of the desorption of NO molecules produced by the recombination reaction of adsorbed N and O desorbed at 550 K exhibits a peak intensity at theta=+15 degrees (normal to the (111) terraces). (C) 1997 American Institute of Physics.
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页码:311 / 320
页数:10
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