Arresting ultraviolet-laser damage in fused silica

被引：6

作者：

Dahmani, F ^{[1
]}

Burns, SJ

Lambropoulos, JC

Papernov, S

Schmid, W

机构：

[1] Univ Rochester, Dept Mech Engn, Rochester, NY 14623 USA

[2] Univ Rochester, Laser Energet Lab, Rochester, NY 14623 USA

来源：

OPTICS LETTERS | 1999年 / 24卷 / 08期

关键词：

Birefringence - Crack propagation - Fused silica - Laser damage - Stress concentration - Tensile stress - Thermal expansion - Ultraviolet radiation;

D O I：

10.1364/OL.24.000516

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The 351-nm laser-damage initiation threshold for surface damage in conventionally polished fused silica is demonstrated to be stress dependent. By circumferential application of modest loads to a sample, a controllable stress field can be established within the clear aperture of a fused-silica specimen, in response to which both the damage-initiation fluence and the crack-propagation fluence requirements are increased above those for unstressed conditions. (C) 1999 Optical Society of America.

引用

页码：516 / 518

页数：3

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