Preparation and electron field emission of carbon nanowall by Cat-CVD

被引:44
作者
Itoh, T
Shimabukuro, S
Kawamura, S
Nonomura, S
机构
[1] Gifu Univ, Dept Elect Engn, Gifu 5011193, Japan
[2] Gifu Univ, Grad Sch Engn, Gifu 5011193, Japan
关键词
carbon nanowall; nanostructured carbon; catalytic CVD; electron field emission;
D O I
10.1016/j.tsf.2005.07.216
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
Carbon nanowall (CNW) films have been prepared by catalytic chemical vapor deposition using only CH4 gas. In the SEM images of the samples prepared at a substrate heating temperature, T-s, of 500 degrees C, the wall structures on the substrates were observed. In those prepared at T-s of 400 degrees C, however, the wall structure was not observed. The electron field emission from the CNW films was observed at small electric field. The wall width and height increased when the Raman intensity ratio, I-D/I-G, decreased. Then, the threshold electric field decreased. The smallest threshold electric field was 2.6 V/mu m in this work. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:314 / 317
页数:4
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