Stimulated scattering of excitons into microcavity polaritons

被引：5

作者：

Huang, R ^{[1
]}

Tassone, F

Yamamoto, Y

机构：

[1] Stanford Univ, Edward L Ginzton Lab, Stanford, CA 94305 USA

[2] NTT, Basic Res Labs, Atsugi, Kanagawa 2430198, Japan

来源：

MICROELECTRONIC ENGINEERING | 1999年 / 47卷 / 1-4期

关键词：

D O I：

10.1016/S0167-9317(99)00225-7

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We have observed the bosonic enhancement of the elastic exciton-exciton scattering rate in a semiconductor microcavity. The bosonic signature is in the enhancement of the scattering rate that is proportional to the final state occupation number. This gain process for exciton-polaritons is distinctly different from that in a conventional photon laser, because of the fermionic nature of the exciton's constituents, the electron and hole. This distinction becomes prominent at large final state occupation numbers, where we observe a saturation and reduction in the gain. We discuss the origins of this saturation behavior.

引用

页码：325 / 327

页数：3