Growth properties and structural analysis of ZnO films and of Au clusters on ZnO

被引:12
作者
Ay, A [1 ]
Nefedov, A [1 ]
Zabel, H [1 ]
机构
[1] Ruhr Univ Bochum, Inst Expt Phys Festkorperphys, D-44780 Bochum, Germany
关键词
reflection high-energy electron diffraction; atomic force microscopy; X-ray scattering; ZnO;
D O I
10.1016/S0169-4332(02)01121-2
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have studied the possibility to grow O-terminated ZnO(0001) films on Al2O3 substrates with high epitaxial quality. After growth via sputtering methods, the ZnO films were annealed to increase the film quality resulting in a mosaicity of 0.60degrees and a surface roughness of <3 Angstrom. Finally, gold films were sputtered at room temperature on the surface. The structural properties of the samples were investigated by X-ray scattering, reflection high-energy electron diffraction (RHEED) and by atomic force microscopy (AFM). AFM images clearly demonstrate that gold films with a nominal thickness of <50 Angstrom form clusters, which can be as high as 300 Angstrom. X-ray diffraction (XRD) studies reveal a predominant (111) texture of the clusters. Further deposition of Au leads to coalescing clusters smoothing out the surface. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:329 / 335
页数:7
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