Field emission from patterned carbon nanotube emitters produced by microwave plasma chemical vapor deposition

被引：43

作者：

Yu, J ^{[1
]}

Zhang, Q ^{[1
]}

Ahn, J ^{[1
]}

Yoon, SF ^{[1
]}

Rusli ^{[1
]}

Li, YJ ^{[1
]}

Gan, B ^{[1
]}

Chew, K ^{[1
]}

Tan, KH ^{[1
]}

机构：

[1] Nanyang Technol Univ, Ctr Microelect, Singapore 639798, Singapore

来源：

关键词：

carbon nanotubes; patterns; field emission; microwave plasma CVD;

D O I：

10.1016/S0925-9635(01)00496-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Large area carbon nanotube patterns were fabricated by microwave plasma chemical vapor deposition. The carbon nanotubes were grown on pre-patterned catalyst films. Scanning electron microscopy and Raman spectroscopy were used to characterize the structure of the carbon nanotubes. The carbon nanotubes were very uniform and approximately 100 nm in diameter. The Raman spectrum shows a good graphitization for the carbon nanotubes. Aligned growth was found on the pattern line area. Field emission characteristics of the patterns were characterized. A threshold field of 2.0 V / mum and emission current density of 1.1 mA/cm(2) at 3.6 V / mum were achieved. A clear and stable image showing the patterns were obtained. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：2157 / 2160

页数：4

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