Sputter deposition of cathodes in organic light emitting diodes

被引：84

作者：

Hung, LS ^{[1
]}

Liao, LS

Lee, CS

Lee, ST

机构：

[1] Eastman Kodak Co, Imaging Res & Adv Dev, Rochester, NY 14650 USA

[2] City Univ Hong Kong, Dept Phys & Mat Sci, Hong Kong, Peoples R China

来源：

JOURNAL OF APPLIED PHYSICS | 1999年 / 86卷 / 08期

关键词：

D O I：

10.1063/1.371410

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Sputter deposition was employed for cathode preparation in organic light emitting diodes (OLEDs). A thin film of copper phthalocyanine (CuPc) was found to be an effective buffer layer in preventing sputter damage to the OLED layer structure. However, the CuPc layer forms an electron-injection barrier with the underlying Alq layer, resulting in increased electron-hole recombination in the nonemissive CuPc layer, and thus a substantial reduction in electroluminescence efficiency. Incorporation of Li at the CuPc/Alq interface from a sputter-deposited Al (Li) cathode was found to reduce the injection barrier at the interface and make the overall device efficiency comparable to a device having an evaporated MgAg cathode. The devices exhibited good operational stability with a half lifetime greater than 3800 h at 20 mA/cm(2). (C) 1999 American Institute of Physics. [S0021-8979(99)08520-5].

引用

页码：4607 / 4612

页数：6

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