Low energy response of silicon pn-junction detector

被引:72
作者
Hartmann, R
Hauff, D
Lechner, P
Richter, R
Struder, L
Kemmer, J
Krisch, S
Scholze, F
Ulm, G
机构
[1] KETEK GMBH,D-85764 OBERSHCLEISSHEIM,GERMANY
[2] PHYS TECH BUNDESANSTALT,D-10587 BERLIN,GERMANY
关键词
D O I
10.1016/0168-9002(96)00254-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The response function of implanted silicon detectors in the soft X-ray region (150 eV-6 keV) has been measured. To reduce signal charge loss in the highly doped p(+)-region just beneath the detector surface, different techniques of producing shallow doping profiles and enhancing the electric field at the pn-junction are presented. The spectroscopic resolution could be improved significantly. On (100) detector material, a peak to valley ratio of 5700:1 for the mangan K-alpha line was achieved. The measured pulse-height distributions were fitted by a detector model, taking the doping profile of the entrance window into account. The results of the fit were in excellent agreement with the measurement data over the entire energy range.
引用
收藏
页码:191 / 196
页数:6
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