Light trapping effect in silicon wafers with anodically etched surfaces

被引:9
作者
Krotkus, A
Pacebutas, V
Kavaliauskas, J
Subacius, I
Grigoras, K
机构
[1] Semiconductor Physics Institute, 2600 Vilnius
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1997年 / 64卷 / 04期
关键词
D O I
10.1007/s003390050490
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Spectral dependencies of the transmittivity and the photoresponse of silicon wafers one face of which was covered with a porous layer have been measured. These experiments had evidenced an increase of the light intensity absorbed in the wafer, which was largest at the wavelengths corresponding to the bandedge transitions. Experimental observations have been explained in terms of multiple light scattering inside the wafer caused by rough surface of the porous layer.
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页码:357 / 360
页数:4
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